Week 10:Sheath formation in a dc discharge, Sheath potential at a floating wall, DC magnetron discharges, Pulsed DC discharges
Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings. Examples include hard, wear-resistant coatings, low friction coatings, corrosion resistant coatings, decorative coatings and coatings with specific optical, or electrical properties. Although the basic sputtering process has been known and used for many years, it is the development of the unbalanced magnetron and its incorporation into multi-source and closed-field systems that have been responsible for the rise in importance of this technique. The development, fundamental principles and applications of Closed-field unbalanced magnetron sputtering will be discussed this week
Course Material
- Week 1: Introduction
- Wee k 2: Concept of a Distribution Function, Forms of the Distribution Function
- Week 3: Interactions between Charged Particles, Plasma Parameter, Defining Characteristics of a Plasma
- Week 4: Collisions, Elastic collisions, Inelastic collisions
- week 5: Creating a low temperature plasma
- Week 6: Plasma Chemistry
- Week 7: Fluid plasma description
- Week 8: Electrical breakdown, Secondary electron emission and avalanches, Townsend’s theory
- Week 9: Paschen’s law, Minimum breakdown voltage, Self sustaining glow discharge, Discharge structure, DC discharges
- Week 10:Sheath formation in a dc discharge, Sheath potential at a floating wall, DC magnetron discharges, Pulsed DC discharges
- Chapters 10
- Department Physics
- Teacher
Dr. Safdar Hussain
