Week 9 : Nanofabrication through Electron Beam Lithography

Electron Beam Lithography (EBL) is a specialized technique for creating extremely fine patterns down to sub 10nm. It can also produce high volume and high density nanoscale patterning for Deep UV optical lithography and Nanoimprint lithography through the formation of master masks and templates for these techniques.

The main drawbacks of this techniques are:

1) It is very slow, being one or more orders of magnitude slower than optical lithography  

2) It is expensive and complicated – electron beam lithography tools can cost many millions of dollars and require frequent service to stay properly maintained.

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lesson-9-e-beam-lithography.pdf (0.29 MB )