Description: This aim of this course is to provide the students with a comprehensive overview of the pulsed laser deposition technique. Pulsed laser deposition is an exciting new film deposition process that can be applied to virtually any material from pure elements to six-element compounds. With pulsed laser deposition, researchers around the world are making high quality, epitaxial thin films of a wide range of different materials and studying their chemical and physical properties or utilizing them in advanced device implementations. Materials deposited by pulsed laser deposition include high Tc superconductors, ferrites, ferroelectrics, optoelectronics, metals, insulators, and biomaterials. This course provides a background in pulsed laser deposition fundamentals including plasma plume characteristic and growth kinetics. A comparison with other film deposition techniques will also be discussed.

Learning Outcome: At the end of this course, students should be able to:

1. Learn about the history and fundamentals of laser and pulsed laser deposition technique.
2. Discuss the equipment used for pulsed laser deposition, including lasers, optics, deposition systems, safety, facilities, etc.
3. Understand the characteristics and diagnostics of laser-produced plumes.
4. Know the applications of pulsed laser deposition such as high-temperature superconducting thin films, oxide films of semiconductors, ferroelectrics, ferrites, fluoride thin films etc

Contents

1. Introduction to lasers
2. Q-switching and mode-locking
3. Generation of Pico-second and Femto-second pulses
4. Different types of Laser Systems
5. Thin Film Deposition Techniques
6. Fundamentals of Pulsed Laser Deposition (PLD)
7. Equipment for thin film deposition
8. Mechanisms of Pulsed Laser Sputtering
9. Diagnostics and characteristics of laser produced plasma
10. Particulates Generated by Pulsed Laser Ablation
11. Angular distribution of Ablated Material
12. Film Nucleation and Film Growth
13. Process characteristics and Film properties in Pulsed Laser Plasma Deposition
14. Novel Pulsed Laser deposition approaches
15. Future trends in Pulsed Laser Deposition
16. Rare-Earth doped Fluoride thin films 

Recommended Books

1. Pulsed Laser Deposition of Thin Films, by Duglos B. Chrisey, and Grahm K. Hubler,  John Wiley & Sons, NY, (1994).
2. Laser Fundamentals, by W. T. Silfvast, Cambridge University press, (2003).

Suggested Books

1. Pulsed Laser Deposition of Thin Films, by Robert Eason, Wiley, (2007).
2. Laser material processing, by William M. Steen, (2003).
3. Principles of lasers, by O. Svelto, Plenum press new York & London (1992).
4. Lasers, by J. Eberly and P. Milonni, Wiley, New York, (1988).
5. Lasers, by A.E. Siegman, University, Science Books Mill Valley, C. A. (1986).
6. Laser Theory, by H. Haken, Springer, Berlin (2003).Understanding lasers, by J. Hecht, Howard W. Sams & Company, USA (1988).
7. Lasers and Electro-Optics: Fundamental and Engineering, by Christopher C. Davis, Cambridge University press (1996).
8. Handbook of Thin Film Deposition Processes and Techniques by Krisna Seshan, Elsevier (2001). 

ASSESSMENT CRITERIA

• Sessional: 20 (Presentation / Assignment 10, Attendance 05, Quiz 05)
• Mid-Term Exam: 30
• Final-Term Exam: 50

Time of Class Meeting

Thursday and Friday       9:30 am to 11:00 am

Key Dates

Commencement of Classes                                                   March 02, 2020

Mid Term Examination                                                            April 27 to May 04, 2020

Final Term Examination                                                          June 22-26, 2020

Declaration of Result                                                              July 03, 2020