Process characteristics and Film properties in Pulsed Laser Plasma Deposition
Pulsed Laser Deposition of Thin Films, by Duglos B. Chrisey, and Grahm K. Hubler, John Wiley & Sons, NY, (1994).
Page Nos. 255-262
Course Material
- Introduction to lasers
- Q-switching and mode-locking, Generation of Pico-second and Femto-second pulses
- Different types of Laser Systems
- Thin Film Deposition Techniques
- Fundamentals of Pulsed Laser Deposition (PLD)
- Equipment for thin film deposition
- Mechanisms of Pulsed Laser Sputtering
- Diagnostics and characteristics of laser produced plasma
- Mid term
- Particulates Generated by Pulsed Laser Ablation
- Angular distribution of Ablated Material
- Film Nucleation and Film Growth
- Process characteristics and Film properties in Pulsed Laser Plasma Deposition
- Novel Pulsed Laser deposition approaches
- Future trends in Pulsed Laser Deposition
- Rare-Earth doped Fluoride thin films
- Chapters 16
- Department Physics
- Teacher
Dr. Muhammad Anwar-Ul-Haq
